Eulitha AG of Villigen, Switzerland, a producer of nanostructures using advanced lithography techniques, announced that it has signed a joint-development and licensing agreement with EV Group (EVG), a supplier of wafer bonding and lithography equipment. Under the terms of the collaborative agreement, EVG will integrate Eulitha’s PHABLE mask-based ultraviolet (UV) photolithography technology with EVG’s automated mask aligner product platform. The collaboration's goal is to develop a low-cost-of-ownership (CoO) nanopatterning solution for producing HB-LEDs. The companies report that demo capabilities are in place already, and the first products are expected to reach the market in 2012.
In addition to enabling the production of LEDs, Eulitha says that the technology also supports the production of solar cells and liquid crystal displays. Eulitha notes that the fabrication technology combines the low cost, ease-of-use and non-contact capabilities of proximity lithography with sub-micron resolution, making it ideally suited for patterning sapphire substrates to enhance the light extraction of LED devices. EVG plans to offer a PHABLE enabled EVG620 system as an extension to its well- established mask alignment system platform, giving customers an even wider choice of configuration options.
Harun Solak, CEO of Eulitha stated, “We believe the synergies of our respective technologies have great potential to provide the resolution and volume-production capabilities of lithography steppers at a fraction of the cost—enabling LED, optics and photonics manufacturers with extremely tight cost constraints the opportunity to extend their technology roadmaps to higher levels of performance.”
Source:
