Research into the emerging field of quantum computing will be carried out at the Institute for Interdisciplinary Information Sciences (IIIS) at Tsinghua University in Beijing using recently purchased plasma systems from UK-based etch and deposition system maker Oxford Instruments.
The IIIS is currently installing a new cleanroom, and has selected tools from Oxford Instruments to provide three systems to undertake this key research. The PlasmaPro100 ICP etch system, PlasmaPro100 PECVD deposition system with TEOS, and a FlexAL ALD system are all suitable for this type of research due to their high performance, flexibility and ease of service, says Oxford Instruments.
"We chose Oxford Instruments systems after a stringent tendering process, comparing system functionality and cost," says Dr Song, associate researcher at Tsinghua University. "Our decision to purchase its plasma etch and deposition tools was due to Oxford Instruments' wide range of processes and applications, the suite of systems available from this one global supplier, and the excellent service and support available to customers," he adds.
"IIIS aims to become one of the leading research centres on interdisciplinary information sciences in the world as well as to offer a facility for the research and education of theoretical computer science and quantum information science in China," Song continues. "We are committed to building and operating a world-class Quantum NanoFabrication facility, to the combined benefit of Tsinghua University's researchers and collaborators."
