Semiconductor process equipment maker SAMCO Inc has held a completion ceremony for its second production center (a two-floor steel-framed building adjacent to the headquarters in Kyoto, Japan), which began construction in January and is expected to begin operation in the fall. The new center boosts Samco's original shipment capacity of 6-7 billion yen per year to a total of 10-11 billion yen per year).
Samco offers systems and services that revolve around three major technologies, namely thin-film deposition with plasma-enhanced chemical vapor deposition (PECVD), metal-organic chemical vapour deposition (MOCVD) and atomic layer deposition (ALD) systems; microfabrication with inductively coupled plasma (ICP) etching, reactive ion etching (RIE) and deep reactive ion etch (DRIE) systems; and surface treatment with plasma cleaning and ultraviolet (UV) ozone cleaning systems.
"We expect to see an increased demand for dry etching and CVD systems due to the the Internet of Things' [IoT's] rapid expansion, as well as anticipated growth in the medical and robotics industries," says president, chairman & CEO Osamu Tsuji. "With the completion of our newest production center, Samco is prepared to meet those demands."
Containing a total land area of 1260m2, the second production center's total floor space is 1130m2 (including a 217.612 cleanroom). It will mainly be used to assemble and modify processing equipment for mass production. The 600 million yen investment also included renovation of the existing production technology building.
The new production center's eco-friendly design utilizes LED lighting, as well as an energy-efficient air conditioner and large-scale solar panel that spans the roof and provides a portion of the building's electricity (up to 50kW/h). Additionally, the roof is coated with high-insulation paint.
