CVD Equipment Corp of Central Islip, NY, USA (a designer and maker of chemical vapor deposition, gas control, and other equipment for developing and manufacturing materials and coatings) has announced the next phase in its industrial partnership with Penn State University (PSU) to advance 2D crystal device development.
"We are pleased to continue to benefit from the industrial perspective and specialized equipment manufacturing expertise that CVD Equipment Corporation brings as part of our ongoing collaboration," comments Joan Redwing, Professor of Materials Science and Engineering, Chemical Engineering and Electrical Engineering. Redwing will lead the consortium with a goal to advance the state-of-the-art in crystal growth of 2D materials over wafer-scale areas.
The National Science Foundation's Materials Innovation Platform (MIP) recently awarded $17.8m over five years to fund a national user facility, based at Penn State's Materials Research Institute, for developing new materials for next-generation electronics.
CVD will contribute through the supply and development of equipment required for synthesizing 2D materials at the wafer scale. The firm says that promise of emerging 2D materials (including graphene, boron nitride and transition metal dichalcogenides) for revolutionizing the semiconductor and electronic device industries is reinforced by this platform award from the National Science Foundation. The user facility at PSU will aim to synthesize 2D crystals for use in faster, more energy efficient, and flexible electronics.