Epitaxial deposition and process equipment maker Veeco Instruments Inc of Plainview, NY, USA says that Switzerland’s école Polytechnique Fédérale de Lausanne (EPFL) has ordered a NEXUS ion beam etch (IBE) system, to be used for R&D projects in micro- and nano-fabrication. Veeco’s IBE systems are used to etch precise, complex features for high-yield production of discrete microelectronic devices and components.
“Ion beam etch is important in our micro- and nano-fabrication because we need the ability to accurately etch difficult-to-etch materials and multi-layer stacks used in today’s emerging applications,” says EPFL’s Dr Philippe Flückiger director of operations. “Veeco’s technology also provides us a level of precision in defining our structures not available with other dry etching techniques,” he adds.
“Given the growing trend of thin-film-based sensors being used in various consumer applications, we are very excited that our IBE technology has been selected by a new customer – EPFL – which is a top European research institution,” comments Veeco’s VP & general manager Vivek Vohra. “We look forward to supporting their innovative research and industry collaborations.” Veeco’s IBE and other technologies are used globally for etching/depositing various thin films to produce micro-electro-mechanical systems (MEMS) and magnetic sensors.
