Buoyed by the success of its Compact 21 range of research systems, at the recent North American Molecular Beam Epitaxy Conference (NAMBE 2013) in Banff, Canada (5-11 October) Riber S.A. of Bezons, France launched the Compact 21 DZ 3"-wafer molecular beam epitaxy (MBE) research system.
Reckoned to be the first system of this size to integrate 12 geometrically equivalent cell-source ports, the new model combines flexibility and what are claimed to be outstanding performance capabilities with reduced operating costs. Particularly compact, it is designed to meet the needs of users looking to minimize their fixed costs.
The Compact 21 DZ system is especially designed for fundamental research on new compound semiconductors for the microelectronics or optoelectronics industries, particularly for structures based on III-V, II-VI, GaN materials, graphene, oxides, etc. In particular, it is recommended for the development of emerging technologies, such as ultraviolet (UV) LEDs or high-performance solar cells.
The Compact 21 is the industry's top-selling range of MBE systems, with more than 100 installed worldwide. Riber says that the launch of the Compact 21 DZ illustrates its strategy to develop and promote its range of MBE systems, supporting the firm's development of new markets and buoyant geographical segments.
