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German Company Will Lead a New Effort to Shrink EUV Lithography Resolution to 14nm
Aug 2, 201202 Aug 2012 German company will lead a new effort to shrink extreme ultraviolet (EUV) lithography resolution from 20nm to 14nm. EUV optics The optics giant Carl Zeiss is to lead a new project to improve the resolution of extreme ...
Tags: Zeiss, 7M, EUV optics project, 02 Aug 2012, from 20nm to 14nm