Technologies of Santa Clara, CA, USA, which designs and makes infrared and fiber-optic temperature and gas sensing solutions, has introduced its UV 400 and UVR 400 pyrometers, the newest generation of non-contact temperature measurement instrumentation for metal-organic chemical vapor deposition (MOCVD) processes.
Using a center wavelength in the UV spectrum (400 nm) these pyrometers make it possible to measure real wafer surface temperature, while traditional pyrometers are only able to measure the susceptor/pocket temperature under the wafer. This allows the most accurate and repeatable control of the wafer temperature which, for example, in LED production is critical to the final product wavelength and manufacturing yields. The wide temperature range of 650-1300°C allows for measurement of various applications, such as GaN buffer layer growth or multiple quantum well growth. The fast response time of up to 8ms allows the measurement of fast processes. True photon-counting instrumentation guarantees the best achievable signal to noise ratio and stability, says the firm.
In addition to the UV 400 pyrometer, the UVR 400 features a 635nm Laser Reflectometer, which enables the real-time measurement of the thickness and growth rate of the GaN layer during epitaxy growth.
"With an 8000+ system-installed base in the semiconductor industry and a nearly 2000 MOCVD tool-installed base, LumaSense is without doubt a leader in temperature instrumentation in this industry," says Brett Sargent, VP & general manager, Products & Solutions, LumaSense Technologies. "The UV 400 and UVR 400 are now setting a new standard for MOCVD measurement all around the world as the instruments have proven to provide temperature measurements with reliable correlation between the measured process temperature and the final product wavelength."
The UV 400 and UVR 400 can also be combined with the PhotriX pyrometer with concentric lightpipe from LumaSense to additionally control the reactor temperature.
