Aixtron SE announced that a new customer, Sinoepi, a manufacturer of wafer materials in China, has placed an order for one CRIUS II-L MOCVD system in a 69x2-inch wafer configuration. The system will be used for the production of epitaxial wafers for ultra-high brightness (UHB) gallium nitride (GaN) based LEDs. Aixtron says that Sinoepi ordered in the fourth quarter of 2011, and the system was delivered during the second quarter of 2012. Aixtron´s local service support team will install and commission the CRIUS II-L at the Sinoepi production complex located in Beijing.
“Although this is our first new piece of equipment from Aixtron, my team is already very familiar with CRIUS technology,” said Mr. Ye, General Manager of Sinoepi. “We are particularly impressed with its high performance-to-cost ratio compared to other systems, as well as the seamless and short process transfer. CCS technology is well established around the world due to its outstanding reputation for producing superior performance LEDs. The CRIUS® II-L matches our requirements for very high throughput epitaxial growth of nitride-based wafer materials excellently. It will enable us to develop our processes quickly and efficiently.”
Source:
