UK-based etch,deposition and growth system maker Oxford Instruments Plasma Technology(OIPT),part of Oxford Instruments plc,and MIT's Microsystems Technology Laboratories(MTL)of Cambridge,MA,USA will hold a 1 day seminar addressing the latest research and technologies in plasma etch deposition and growth.The event,which will include presentations,discussions,and a networking lunch,will take place on 5 December 2012 at the MIT campus in Cambridge,MA.
"We've been hosting these successful seminars worldwide for several years,most recently in The Molecular Foundry,LBNL,Caltech,USA and Shanghai,China,and we typically attract a large number of participants to each event",says Stuart Mitchell,VP Sales for Oxford Instruments America Inc,"These workshops provide an ideal opportunity for academic and industrial technologists to network and share ideas,and we are delighted to be holding this joint workshop with Microsystems Technology Laboratories."
Speakers will include:Prof.Erwin Kessels,Technical University Eindhoven;and Vince Genova,Cornell University.In addition,experts in their field from Oxford Instruments&MTL will speak about recent process and applications developments in a number of plasma processing areas.
Presentations cover a full day and currently include:
- ALD applications
- An Overview of Plasma ALD process
- MEMS process
- Nanoscale dielectric etching
- PECVD&TEOS
Dr.Vicky Diadiuk,associate director,Operations,at MTL,"This event at MTL will allow our students and researchers to learn more about Atomic Layer Deposition and plasma processing,from the experts at Oxford Instruments,while also attracting participants from the wider technical community.We look forward to welcoming guests to MIT for what promises to be a full and interesting day."
