Epitaxial deposition and process equipment maker Veeco Instruments Inc of Plainview, NY, USA says that solid-state lighting manufacturer HC SemiTek Corp of Wuhan, China (which supplies full-spectrum visible light LED chips) has ordered multiple TurboDisc EPIK 700 GaN (gallium nitride) metal-organic chemical vapor deposition (MOCVD) systems and the TurboDisc K475i As/P (arsenic phosphide) MOCVD system for high-volume LED production.
HC SemiTek says that it ordered the systems on the basis of the award-winning EPIK platform and its own experience with other Veeco MOCVD reactors, including the TurboDisc MaxBright, K465i and K475 MOCVD systems. The EPIK and K475i systems will be installed to meet market demand driven by the need for high performance LEDs in lighting and fine-pitch displays.
"The seamless process transfer between legacy and new Veeco platforms made this an easy decision," comments HC SemiTek's president Dr Rong Liu. "Adding the EPIK and K475i systems to our production fleet ensures we can achieve the most optimal device performance while lowering our cost of ownership to accelerate our company's growth objectives."
"HC SemiTek, a leader in the Chinese LED market, has long been a valuable and important customer to Veeco," comments Veeco's president William J. Miller Ph.D.
Introduced in 2014, the EPIK 700 MOCVD system is reckoned to be the LED industry's highest-productivity system for blue/green LEDs. Introduced earlier this year, the K475i system can be used to make red, orange and yellow LEDs, as well as multi-junction III-V solar cells, laser diodes and transistors. Based on Veeco's proven TurboDisc technology and the proprietary Uniform FlowFlange, Veeco says that its MOCVD systems enable users to achieve cost per wafer savings of up to 20% compared with previous MOCVD systems through improved wafer uniformity, reduced operating expenses and increased productivity.
