UK-based etch, deposition and growth system maker Oxford Instruments says that Canada’s University of Alberta nanoFAB open-access fabrication and characterization facility has purchased three plasma etch systems to provide upgraded capabilities to its installed base and to facilitate the growing demand for its purpose-built cleanroom.
The PlasmaPro 100 Estrelas, PlasmaPro 100 Cobra and PlasmaPro 80 PE/RIE dual-mode systems will soon be installed in the nanoFAB, offering users a wide range of process options.
The most recent addition to the PlasmaPro family of tools, the PlasmaPro Estrelas100 deep silicon etch technology was developed with the R&D market in mind, offering maximum process flexibility. Nano and micro structures can be realised as the hardware has been designed with the ability to run Bosch and cryo etch technologies in the same chamber. The PlasmaPro 100 Cobra and PlasmaPro 80 PE/RIE systems have equally high specifications, are versatile and suitable for both R&D and production needs.
“Over 15 years of operation, the nanoFAB has proven to be a great learning, R&D and small-volume production environment,” says nanoFAB’s director Dr Eric Flaim. “Our decision to purchase Oxford Instruments plasma systems was based on their flexibility, quality and ease of use, in addition to their extensive process offering and ability to scale from research to production,” he adds.
“As an open-access facility we aim to offer our users the broadest range of processing opportunities possible,” notes operations manager Keith Franklin. “The customer support we receive is excellent; from maintenance to user training, Oxford Instruments has demonstrated excellent and reliable service from its global support network,” he comments.
