Veeco Instruments Inc.announced that AZZURRO Semiconductors AG,a pioneer in GaN-on-Si technology headquartered in Germany,has recently placed into production the TurboDisc®K465i™gallium nitride(GaN)Metal Organic Chemical Vapor Deposition(MOCVD)System.
The MOCVD system is used to make gallium nitride on silicon(GaN-on-Si)wafers for power semiconductors,LED wafers and LED template wafers that enable customers to leverage the technology advantage of the GaN-on-Si technology themselves.
Dr.Markus Sickmöller,Vice President Operations of AZZURRO,commented,"Our technology provides high-quality,crack-free GaN layers on 150mm standard silicon wafers with very good crystal quality and extremely low bow values.We chose Veeco's K465i to produce these high efficiency GaN-on-Si stacks because of its performance,process stability,and high throughput.We believe our GaN-on-Si technology will trigger a new wave of highly efficient and cost-optimized components for the LED and power semiconductor industry."
Jeff Hawthorne,Veeco's Senior Vice President,MOCVD,commented,"The power electronics device market is forecasted by Yole Développement to be$25B by 2015,and GaN has the ability to make devices with higher efficiency and switching speed than traditional Si devices.Further,LEDs made with GaN-on-Si technology will enable lower LED costs.We anticipate that the demand for MOCVD tools for these GaN-on-Si applications will grow as technology moves from R&D into production.Veeco's K465i systems offer key advantages for GaN-on-Si production,including low particle count and excellent yields,and we're looking forward to continuing to support AZZURRO's growing GaN-on-Si business."