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CVD System
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Episil Semiconductor Wafer Put Into Operation an Aix G5 WW CVD Reactor for SiC Epitaxy
Mar 4, 2015Deposition equipment maker Aixtron SE of Aachen, Germany says that Taiwanese group Episil Semiconductor Wafer Inc has put into operation an AIX G5 WW (Warm-Wall) chemical vapor deposition (CVD) reactor for silicon carbide (SiC) epitaxy. ...
Tags: silicon components, Electronics
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The First Semiconductor Laser Consisting Solely of Main Group IV Elements
Jan 22, 2015In cooperation with international partners, Germany’s Forschungszentrum Jülich and the Paul Scherrer Institute (PSI) in Villigen, Switzerland have presented what is claimed to be the first semiconductor laser consisting solely of ...
Tags: Group-IV Lasers, clock signal, Electrical
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Japanese Manufacturer Showa Denko Qualify Its Most Recent System for Manufacturing Sic
Oct 31, 2014Deposition equipment maker Aixtron SE of Aachen, Germany says that Japanese manufacturer Showa Denko has qualified its most recent system for manufacturing silicon carbide (SiC) epitaxial wafers. The new AIX G5 WW (Warm-Wall) chemical vapor ...
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Altatech Semiconductor S.A. Received an Order From The University of Washington in Seattle
Apr 3, 2014Altatech Semiconductor S.A. of Montbonnot, near Grenoble, France (a subsidiary of Soitec since January 2012) has received an order from the University of Washington in Seattle for an AltaCVD chemical vapor deposition (CVD) system, whose ...
Tags: CVD System, Process Materials
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Researchers in France Have Developed a Technique to Directly Grow Graphene
Mar 13, 2014Researchers in France have developed a technique to directly grow graphene on aluminium nitride (AlN) crystalline templates on silicon substrates [A. Michon et al, Appl. Phys. Lett., vol104, p071912, 2014]. Up to now, attempts to use ...
Tags: Electrical, Electronics
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Researchers Based in China and Sweden Have Proposed Fast CVD
May 17, 2013Researchers based in China and Sweden have proposed fast chemical vapor deposition (CVD) of graphene as a route to more cost-effective transparent conducting layers (TCLs) for nitride semiconductor light-emitting diodes (LEDs) [Xu Kun et ...
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Femto Science Selected UVOTECH Systems as Its US Sales and Support Representative
Dec 25, 2012To enhance its service to customers throughout the USA, South Korea's Femto Science Inc, which manufactures plasma cleaning systems, etching (RIE and ICP) systems and Parylene coating systems (CVD), has selected UVOTECH Systems Inc of ...
Tags: South Korean, etch, CVD, UVOTECH
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Altatech Introduces AltaCVD Solarlab for Deposition of PV Materials
Oct 2, 20122 October 2012 Altatech introduces AltaCVD Solarlab for deposition of PV materials Altatech of Montbonnot Saint Martin,near Grenoble,France,a subsidiary of Soitec,has introduced a multi-chamber chemical vapor deposition(CVD)system that ...
Tags: Altatech, AltaCVD Solarlab system, PV materials, solar cell
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Aixtron SE Added a SIC CVD Warm-Wall Planetary Reactor System to Its Aixtron Equipment
Aug 30, 2012Deposition equipment maker Aixtron SE of Herzogenrath,Germany says that Showa Denko of Chichibu,Japan has added a SiC CVD Warm-Wall Planetary Reactor system to its Aixtron equipment base,capable of handling either ten 100mm or six 150mm ...
Tags: Aixtron, Showa Denko, CVD system, deposition equipment maker
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