lithography light source

New Coating on Collector for Extreme Ultraviolet Source Increases Effective Lifetime
Jul 25, 2012
Cymer reports improved EUV optics performance 25 Jul 2012 New coating on collector for extreme ultraviolet source increases effective lifetime by 50%. Bull run:Cymer hits long-term high Lithography light source provider Cymer has ...

Tags: Cymer, EUV optics, effective lifetime, lithography light source