Plasma articles & resources on Made-in-China.com

Oxford Instruments Supplies China's First Mass-Production VCSELs Fab

Aug 27, 2018

UK-based plasma etch and deposition processing system maker Oxford Instruments Plasma Technology (OIPT) says that Sino-semic - the first all-Chinese developer and manufacturer of vertical-cavity surface-emitting lasers (VCSELs) for face ...

Tags: plasma processing systems, LEDs

RIT's Jing Zhang Wins NSF Career Award for Research on UV Photonics

May 18, 2018

Jing Zhang, a faculty member at Rochester Institute of Technology, has received a CAREER award from the US National Science Foundation (NSF) for work to develop new, highly efficient ultraviolet light sources. Zhang’s NSF award of ...

Tags: UV LEDs, UV Photonics

SPTS's Omega Plasma Etch System Chosen by Hiwafer for New 6'' GaN-on-SiC High-Power RF Device Production Line

Nov 28, 2017

SPTS Technologies Ltd of Newport, Wales, UK (an Orbotech company that manufactures etch, PVD and CVD wafer processing solutions for the MEMS, advanced packaging, LED, high-speed RF on GaAs, and power management device markets) has won an ...

Tags: SPTS, GaN-on-SiC, LED

Aixtron Provides Deposition System to EPFL for 2D Materials Research

Sep 27, 2017

Deposition equipment maker Aixtron SE of Herzogenrath, Germany says that Switzerland’s école Polytechnique Fédérale de Lausanne (EPFL) has purchased a BM NOVO system. The versatile tool, which can produce ...

Tags: 2D Materials, Deposition System

Oxford Instruments Boosting Asia-Pacific R&D Center at Taiwan's ITRI

Aug 15, 2017

Oxford Instruments plc plans to increase personnel at its R&D base at Taiwan’s Industrial Technology Research Institute (ITRI), and to leverage ITRI's R&D capacities to strengthen their cooperative relationship in technology ...

Tags: Oxford Instruments

Aluminium Nitride Schottky Barrier Diodes with Breakdown More Than 1kv

Aug 3, 2017

Arizona State University (ASU) in the USA claims the first demonstration of 1kV-class aluminium nitride (AlN) Schottky barrier diodes (SBDs) [Houqiang Fu et al, IEEE Electron Device Letters, 5 July 2017]. AlN has a wide bandgap of 6.2eV. ...

Tags: semiconductor, MOCVD

Monolithic Electrically Injected Microdisk Lasers on Silicon

Aug 1, 2017

Researchers in Russia claim “the first demonstration of an injection quantum well microdisk laser fabricated of III-V materials monolithically grown on silicon (001) substrate” [N. V. Kryzhanovskaya et al, Optics Express, vol. ...

Tags: silicon photonics, Lasers

Samsung Sdi Completes Construction of Ev Battery Plant in Hungary

Jun 1, 2017

Samsung SDI has completed the construction of an electric vehicle (EV) battery plant in Hungary. Samsung SDI President Jun Young-hyun hosted a completion ceremony for the state-of-art electric vehicle (EV) battery plant scheduled to open ...

Tags: Samsung SDI, electric vehicle, battery

Indium Gallium Arsenide Quantum Well Transistors on 300mm Silicon

May 18, 2017

Researchers in South Korea and the USA claim record 2190cm2/V-s effective mobility for indium gallium arsenide (InGaAs) quantum well (QW) metal-oxide-semiconductor field-effect transistors (MOSFETs) on 300mm-diameter (100) silicon ...

Tags: Transistors, MOSFETs

Multi-Junction Si Solar Cell Efficiency Exceeds

Nov 12, 2016

Silicon-based solar cells dominates today’s solar energy industry, while this technology has difficulty in bringing the conversion efficiency beyond 23% for commercialized solar cells in mass production. In order to break the ...

Tags: Solar Cell, solar energy

CORIAL Announces Hard Materials Drie Processes for MEMS Manufacturing

Oct 12, 2016

Plasma etch and deposition equipment maker CORIAL S.A.S. of Bernin, France has announced the availability of hard materials deep etch processes using a new generation of 200mm ICP-RIE (inductively coupled plasma reactive-ion etch) ...

Tags: CORIAL S.A.S., Plasma etch, hard materials deep etch processes

CNR-IMM Italy Using Sentech Peald System for New High-K Materials on Wide-Bandgap Devices

Oct 12, 2016

SENTECH Instruments GmbH of Berlin, Germany says that the Institute for Microelectronics and Microsystems (CNR-IMM) in Catania – which is part of the Physics and Matter Technologies Department (DSFTM) of the National Research Council ...

Tags: SENTECH Instruments GmbH, CNR-IMM

RIT Awarded NSF Grant for ICP-RIE Etch System for Photonics and Nanoelectronic Device R&D

Oct 12, 2016

Jing Zhang, an engineering faculty member at Rochester Institute of Technology, has received a $305,000 grant from the US National Science Foundation (NSF) to acquire an inductively coupled plasma reactive-ion etching (ICP-RIE) system for ...

Tags: RIT, NSF, ICP-RIE system

Oxford Instruments Develops SiC Via Etch for GaN-on-SiC RF Device Manufacture

Oct 12, 2016

UK-based process equipment maker Oxford Instruments has announced the development and launch of a silicon carbide (SiC) via plasma etch process using its PlasmaPro100 Polaris etch system. SiC is becoming an increasingly important ...

Tags: Oxford Instruments, SiC, GaN RF devices

Oxford Instruments Systems Being Used in UV LED Manufacturing

Sep 29, 2016

UK-based Oxford Instruments, which provides process technology equipment for the manufacturing of high-brightness light-emitting diodes (HBLEDs), says that its systems are being used to facilitate the introduction of ultraviolet (UV) LEDs ...

Tags: Oxford Instruments, UV LED

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